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>Anderson localization due to spin disorder: a driving force of
temperature-dependent metal-semiconductor transition in
colossal-magnetoresistance materials
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Anderson localization due to spin disorder: a driving force of
temperature-dependent metal-semiconductor transition in
colossal-magnetoresistance materials
We study temperature induced metal-insulator transition in dopedferromagnetic semiconductors, described by s-d exchange model. The transitionis a result of the mobility edge movement, the disorder being due to magneticions spin density fluctuations. The electrons are described in the tightbinding approximation. Using ideas and methods of Anderson localization theorywe obtain simple formulas, which connect the mobility edge with short-rangeorder characteristics of the magnetic subsystem -- static spin correlators. Wediscuss the application of the theory to several groups of novelcolossal-magnetoresistance materials and include the reproduction of the paper[E. M. Kogan and M. I. Auslender, phys. stat. sol. (b) vol. 147, 613 (1988)]published by us 10 years ago.
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机译:我们研究了由s-d交换模型描述的掺杂铁磁半导体中温度诱导的金属-绝缘体跃迁。该转变是迁移率边缘运动的结果,该紊乱是由于磁自旋密度波动引起的。电子以紧密结合近似描述。使用安德森定位理论的思想和方法,我们获得了简单的公式,这些公式将迁移率边缘与磁性子系统-静态自旋相关器的短程特性联系在一起。我们讨论了该理论在几类新颖的巨磁阻材料中的应用,并包括论文的复制[E. M. Kogan和M. I. Auslender,物理化学。统计资料。溶胶。 (b)卷147,613(1988)]由我们十年前出版。
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